Paper
11 December 1997 Advanced Photon Source undulator beamline tests of a contact-cooled silicon u-shaped monochromator
Wah Keat Lee, Patricia B. Fernandez, Ali M. Khounsary, Wenbing Yun, Emil M. Trakhtenberg
Author Affiliations +
Abstract
At the Advanced Photon Source (APS), undulator insertion devices are capable of producing x-ray beams with a total power of about 5 kW and normal incidence heat fluxes of about 170 W/mm2 at 30 m from the source. On beamlines in which the first optical element is a mirror, the reflected beam from the mirror still carries considerable power and power density. Depending on its location, the monochromator downstream of the mirror might be subject to 300 W total power and 5 W/mm2 normal incidence heat flux. Thus, it is still necessary to carefully design a monochromator that provides acceptable performance under these heat loads. A contact-cooled u-shaped monochromator may be used in this case. The main feature of the u-shaped monochromator is that, by carefully selecting the geometry and cooling locations, it passively corrects for some of the thermally induced crystal distortions. We present experimental and computational results of a contact cooled u-shaped monochromator tested on an APS undulator beamline. The results are encouraging and compare favorably with liquid- gallium internally cooled crystals.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wah Keat Lee, Patricia B. Fernandez, Ali M. Khounsary, Wenbing Yun, and Emil M. Trakhtenberg "Advanced Photon Source undulator beamline tests of a contact-cooled silicon u-shaped monochromator", Proc. SPIE 3151, High Heat Flux and Synchrotron Radiation Beamlines, (11 December 1997); https://doi.org/10.1117/12.294480
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Cited by 4 scholarly publications.
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KEYWORDS
Crystals

Monochromators

Laser crystals

Silicon

Mirrors

Optical components

Crystallography

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