Self-developing photopolymer system with ultraviolet sensitivity

Detlef Kip; Lutz Glabasnia; Rene M. Beaulieu; Roger A. Lessard; Michel Bolte

doi:10.1117/12.279148

22 September 1997 Self-developing photopolymer system with ultraviolet sensitivity

Detlef Kip, Lutz Glabasnia, Rene M. Beaulieu, Roger A. Lessard, Michel Bolte

Proceedings Volume 3135, Precision Plastic Optics for Optical Storage, Displays, Imaging, and Communications; (1997) https://doi.org/10.1117/12.279148
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

Dichromated poly(acrylic acid) films with dimethyl formamide have been investigated as UV photosensitive recording medium for the fabrication of diffractive optical elements. Surface relief structures with large depth modulation have ben formed on these films. Relief depth of surface gratings as a function of exposure time and the spatial frequency of the gratings are presented. Atomic force microscopy 3D views of surface relief gratings are also presented.

Citation Download Citation

Detlef Kip, Lutz Glabasnia, Rene M. Beaulieu, Roger A. Lessard, and Michel Bolte "Self-developing photopolymer system with ultraviolet sensitivity", Proc. SPIE 3135, Precision Plastic Optics for Optical Storage, Displays, Imaging, and Communications, (22 September 1997); https://doi.org/10.1117/12.279148

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