Paper
4 April 1997 Energy enhancer for mask-based laser materials processing
Jens Bastue, Flemming O. Olsen
Author Affiliations +
Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270199
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom
Abstract
A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-carbon-dioxide laser system designed for laser marking has been demonstrated. The energy efficiency may be improved with a factor of 2 - 4 for typical mask transmittances between 10 - 40%.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jens Bastue and Flemming O. Olsen "Energy enhancer for mask-based laser materials processing", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); https://doi.org/10.1117/12.270199
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KEYWORDS
Mirrors

Laser marking

Transmittance

Reflectivity

Laser processing

Energy efficiency

Excimer lasers

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