Submicron DUV lithography using second-harmonic light of copper vapor laser

Huijie Huang; Dunwu Lu; Hongwu Ren; Peihui Liang; Longlong Du

doi:10.1117/12.276054

7 July 1997 Submicron DUV lithography using second-harmonic light of copper vapor laser

Huijie Huang, Dunwu Lu, Hongwu Ren, Peihui Liang, Longlong Du

Author Affiliations +

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276054
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

In order to study the feasibility of submicron lithography using second-harmonic light (SHL) at wavelength of 255.3 nm of copper vapor laser (CVL), a 1:1 catadioptric projection lens and an illumination system are designed and constructed. A resolution of 0.7 micrometers line/space patterns is produced in AZ1350J resist, which reveals that the SHL of CVL can be used as an illumination source in submicron lithography.

Citation Download Citation

Huijie Huang, Dunwu Lu, Hongwu Ren, Peihui Liang, and Longlong Du "Submicron DUV lithography using second-harmonic light of copper vapor laser", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276054

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