Paper
7 July 1997 Structure and property relationships of fractionated novolac resins
K. Rex Chen, Ranee W. Kwong, George M. Jordhamo, Robert D. Allen, Paula M. Gallagher-Wetmore
Author Affiliations +
Abstract
In a previous paper, we described the performance of near- monodisperse novolak resins obtained through supercritical fluid extraction. The low molecular weight partner was found to be the key element for high contrast and high resolution of the reconstructed tandem resists. In this paper, we use 13C NMR spectroscopy to further explore the microstructure and the composition of each fraction. The results show that the percentage of ortho-ortho methylene bond (%o-o') remains relatively constant throughout all the fractions. However, the %o-o' unhindered CH2-bond is higher for the low molecular weight fraction than for that of the high molecular weight fraction. Also, the p-cresol to m-cresol ratio (p/m) is not constant among all the fractions. The p/m ratio of the lower MW fraction is greater than 2, then quickly reduces to 1 and then gradually decreases to 0.6. Since the %o-o' unhindered CH2- linkage is mainly the bond between p-cresol unit, it is expected to see that as the p/m ratio increases, the %o-o' unhindered bond increases. The good lithographic performance of some of the tandem resist described previously is closely related to this high ortho-ortho linkage. However, as the amount of low MW partner increases without corresponding adjustment of PAC loading, microgrooving is observed. We discuss the effect of PAC loading on the lithographic performance in these low molecular rich formulations.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Rex Chen, Ranee W. Kwong, George M. Jordhamo, Robert D. Allen, and Paula M. Gallagher-Wetmore "Structure and property relationships of fractionated novolac resins", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275862
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Cited by 2 scholarly publications.
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KEYWORDS
Picture Archiving and Communication System

Lithography

Manganese

Carbon

Microfluidics

Standards development

Polymers

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