Paper
10 April 1997 Effect of barrier layer thickness on the performance of thin film transistors on glass substrates
J. Gregory Couillard, Dieter G. Ast, Chad B. Moore, Francis P. Fehlner
Author Affiliations +
Abstract
Top-gated poly-Si thin film transistors (TFTs) were fabricated on Corning COde 1737 glass substrates coated with SiO2 barrier layers of varying thickness. The leakage current, or minimum current in the off state of the transistor, was measured and analyzed to evaluate the influence of barrier layer thickness on the TFT characteristics. Our results indicate that using a thick barrier layer may results in higher TFT leakage currents. Control devices on oxidized silicon have higher leakage currents than TFTs on barrier coated Code 1737 glass. Those on glass substrates show the effect of barrier layer thickness. As the barrier layer thickness increases the leakage current also increase. One possible explanation for this is the nature of the glass substrate. Even a thin SiO2 layer can suppress diffusion of electrically active impurities from the substrate to the device. However, aluminoborosilicate glasses such as Corning Code 1737 are also known to act as sinks for sodium and other process impurities. Thick barrier layers separate the TFT from the gettering effects of the substrate and limit the removal of impurities from the device region.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Gregory Couillard, Dieter G. Ast, Chad B. Moore, and Francis P. Fehlner "Effect of barrier layer thickness on the performance of thin film transistors on glass substrates", Proc. SPIE 3014, Active Matrix Liquid Crystal Displays Technology and Applications, (10 April 1997); https://doi.org/10.1117/12.270292
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Glasses

Transistors

Thin films

Silicon

Low pressure chemical vapor deposition

Diffusion

Aluminum

Back to Top