Paper
31 March 1997 Immobilization, stabilization, and patterning techniques for enzyme-based sensor systems
A. William Flounders, Scott C. Carichner, Anup K. Singh, Joanne V. Volponi, Joseph S. Schoeniger, Karl Wally
Author Affiliations +
Abstract
Sandia National Laboratories has recently opened the Chemical and Radiation Detection Laboratory (CRDL) in Livermore, Calif. to address the detection needs of a variety of government agencies (e.g., Department of Energy, Environmental Protection Agency, Department of Agriculture) as well as provide a fertile environment for the cooperative development of new industrial technologies. This laboratory consolidates a variety of existing chemical and radiation detection efforts and enables Sandia to expand into the novel area of biochemically based sensors. One aspect of our biosensor effort is further development and optimization of enzyme modified field effect transistors (EnFETs). Recent work has focused upon covalent attachment of enzymes to silicon dioxide and silicon nitride surfaces for EnFET fabrication. We are also investigating methods to pattern immobilized proteins; a critical component for development of array-based sensor systems. Novel enzyme stabilization procedures are key to patterning immobilized enzyme layers while maintaining enzyme activity. Results related to maximized enzyme loading, optimized enzyme activity and fluorescent imaging of patterned surfaces are presented.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. William Flounders, Scott C. Carichner, Anup K. Singh, Joanne V. Volponi, Joseph S. Schoeniger, and Karl Wally "Immobilization, stabilization, and patterning techniques for enzyme-based sensor systems", Proc. SPIE 2978, Micro- and Nanofabricated Electro-Optical Mechanical Systems for Biomedical and Environmental Applications, (31 March 1997); https://doi.org/10.1117/12.269980
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical lithography

Etching

Photoresist materials

Sensors

Semiconducting wafers

Industrial chemicals

Plasma

Back to Top