Paper
20 September 1996 Preparation and properties of amorphous SmTbFeCo thin films
Z. Q. Lu, Zuoyi Li, Yuankai Zheng, Zuoqi Hu, Rui Xiong, Ke Wang, Gengqi Lin, Y. S. Hu
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Abstract
SmTbFeCO amorphous films were r.f.-magnetron sputtered from a mosaic target onto glass substrate. The magnetic and magneto-optical properties of SmTbFeCo thin films deposited at different argon pressure, sputtering power and negative substrate bias voltage were studied. It is shown that the deposition conditions strongly affect the reflectivity R, the coercivity Hc and Kerr rotation angle (theta) k. In order to meet the requirement of magneto-optical recording, it is optimal to choose Ar pressure of 0.47 approximately 0.73 Pa, sputtering power of 300 approximately 350W, and negative substrate bias voltage of -80V approximately -110V.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Z. Q. Lu, Zuoyi Li, Yuankai Zheng, Zuoqi Hu, Rui Xiong, Ke Wang, Gengqi Lin, and Y. S. Hu "Preparation and properties of amorphous SmTbFeCo thin films", Proc. SPIE 2890, Optical Recording, Storage, and Retrieval Systems, (20 September 1996); https://doi.org/10.1117/12.251974
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KEYWORDS
Argon

Sputter deposition

Thin films

Reflectivity

Magnetism

Ions

Protactinium

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