Novel double-focus interferometer for scanning force microscope

Yongmo Zhuo; Xu-Dong Mou; Yongying Yang; Bin Cao

doi:10.1117/12.250926

13 September 1996 Novel double-focus interferometer for scanning force microscope

Yongmo Zhuo, Xu-Dong Mou, Yongying Yang, Bin Cao

Proceedings Volume 2877, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III; (1996) https://doi.org/10.1117/12.250926
Event: Microelectronic Manufacturing 1996, 1996, Austin, TX, United States

Abstract

A novel double focus optical interferometer for scanning force microscope is presented in this paper. The deflection of the force sensing cantilever is measured by detecting the phase shift of two orthogonal polarized light beams reflected from the end of the cantilever and a reference plane with a hole in the center. We have tested some samples by using this instrument and gotten some high resolution pictures. The instrument provides 0.1 nm height resolution and 5 nm lateral resolution and is especially applicable in the profilometer of the integral circuit, fine grate, etc.

Citation Download Citation

Yongmo Zhuo, Xu-Dong Mou, Yongying Yang, and Bin Cao "Novel double-focus interferometer for scanning force microscope", Proc. SPIE 2877, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III, (13 September 1996); https://doi.org/10.1117/12.250926

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