SPC qualification strategy for CD metrology

Elizabeth E. Chain; Martin G. Ridens; James P. Annand

doi:10.1117/12.250906

13 September 1996 SPC qualification strategy for CD metrology

Elizabeth E. Chain, Martin G. Ridens, James P. Annand

Proceedings Volume 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II; (1996) https://doi.org/10.1117/12.250906
Event: Microelectronic Manufacturing 1996, 1996, Austin, TX, United States

Abstract

Effective statistical process control (SPC) necessitates the use of the proper control chart, used to monitor and control the important process characteristics. The control chart can be used to monitor stability for a process which is normally distributed. Scanning electron microscopy (SEM) critical dimension (CD) measurement, however, shows a systematic variation in repeated measurements of a sample in addition to the Gaussian variation, due to the nature of electron beam irradiation of materials. Because of this systematic variation the standard control charts do not work well for the control of this process. Addition of a slope-subtraction algorithm to the data collection system provides display of the slope-corrected data in addition to the raw data display, and permits the stability of the metrology tool to be demonstrated.

Citation Download Citation

Elizabeth E. Chain, Martin G. Ridens, and James P. Annand "SPC qualification strategy for CD metrology", Proc. SPIE 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II, (13 September 1996); https://doi.org/10.1117/12.250906

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