Spectroscopic ellipsometry and photometry applied to color filter characterization

Christophe Defranoux; Jean-Philippe Piel; Jean-Louis P. Stehle

doi:10.1117/12.246214

16 August 1996 Spectroscopic ellipsometry and photometry applied to color filter characterization

Christophe Defranoux, Jean-Philippe Piel, Jean-Louis P. Stehle

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246214
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

Thin film color filters have been characterized precisely by spectroscopic ellipsometry and transmittance measurement using the new GESP5 SOPRA instrument. Ellipsometry provides precisely not only the thickness of the layers but also the optical indices of a wide wavelength range. The optical index and the absorption are determined independently to allow accurate determination of thickness and pigment concentration and save costly materials. The quality of the layers can be checked from run to run but also on the same panel making mapping measurements. The spatial resolution around 200 micrometers and precise positioning allow measurement in a single pixel. Using these structural informations the theoretical transmittance of the filters can be deduced and compared to the corresponding experimental measurements made with the same instrument.

Citation Download Citation

Christophe Defranoux, Jean-Philippe Piel, and Jean-Louis P. Stehle "Spectroscopic ellipsometry and photometry applied to color filter characterization", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246214

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