Spectroellipsometric study of amorphous thin films

Tomuo Yamaguchi; Ahalapitiya Hewage Jayatissa; K. Kawanishi; M. Aoyama

doi:10.1117/12.246215

16 August 1996 Spectroellipsometric study of amorphous thin films

Tomuo Yamaguchi, Ahalapitiya Hewage Jayatissa, K. Kawanishi, M. Aoyama

Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246215
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

An empirical dielectric function has been proposed for amorphous materials. This function is based on the optical absorption in the inter band region and it follows the Kramers-Kronig dispersion relation of causality. The applicability of this dielectric function was demonstrated by analyzing spectroellipsometric measurements of several amorphous materials which has different band gaps and elements. According to the experimental results, this function is much suitable in the analysis of SE data of amorphous materials.

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Tomuo Yamaguchi, Ahalapitiya Hewage Jayatissa, K. Kawanishi, and M. Aoyama "Spectroellipsometric study of amorphous thin films", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246215

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