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We have developed a new experimental equipment for the ellipsometric study of a physisorption system on a surface of a metal single crystal; a vacuum chamber with an ultimate pressure of 10-9 Pa, a substrate temperature between 40 K and 1000 K, and the automatic null ellipsometer. The adsorption isotherms of Xe/Ag(111) at temperatures between 60 K and 80 K were obtained in the wide pressure range between 10-7 Pa and 10-1 Pa. We found that this ellipsometer made it possible to observe layer growth of a van der Waals condensate from a submonolayer range to a thick layer where equilibrium pressure was nearly equal to the bulk saturation vapor pressure of the adsorbate.
Sin-ichi Igarashi,Takato Hirayama,Ichiro Arakawa, andYukio Abe
"Ellipsometric study of rare gas films physisorbed on a surface of a metal single crystal", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246227
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Sin-ichi Igarashi, Takato Hirayama, Ichiro Arakawa, Yukio Abe, "Ellipsometric study of rare gas films physisorbed on a surface of a metal single crystal," Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246227