Modeling of the performance of a liquid-gallium-cooled silicon monochromator for a high-energy-resolution scattering beamline: comparison with experimental data

Lahsen Assoufid; K. W. Quast; H. L. Thomas Nian

doi:10.1117/12.259836

21 November 1996 Modeling of the performance of a liquid-gallium-cooled silicon monochromator for a high-energy-resolution scattering beamline: comparison with experimental data

Lahsen Assoufid, K. W. Quast, H. L. Thomas Nian

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Proceedings Volume 2855, High Heat Flux Engineering III; (1996) https://doi.org/10.1117/12.259836
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

A finite element analysis method (FEA) was used to predict the performance of a silicon monochromator for a high- energy-resolution scattering beamline at sector 3 of the Advanced Photon Source. The monochromator is internally cooled through 17 rectangular channels with liquid gallium and is designed to operate at photon energies near 14 keV, under beam from a 2.7 cm period undulator. The atomic planes of the monochromator have a orientation with an asymmetric cut angle of 4.5 degrees. The displacement profile calculated from the structural FEA was used to compute the double-crystal rocking curves tat 14.41 keV. Both the simulations and the experiment show that this monochromator will operate at about 40 mA with rocking-curve broadening of only about 0.5 arcsec. This corresponds to a surface heat flux of 1.2 W.mm² and a total absorbed power of about 86 watts. The monochromator was used for the commissioning of the beamline and to perform the first series of experiments up to 100 mA. In this paper, we give the results of the FEA calculations and diffraction simulations and compare these to the experimental data.

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Lahsen Assoufid, K. W. Quast, and H. L. Thomas Nian "Modeling of the performance of a liquid-gallium-cooled silicon monochromator for a high-energy-resolution scattering beamline: comparison with experimental data", Proc. SPIE 2855, High Heat Flux Engineering III, (21 November 1996); https://doi.org/10.1117/12.259836

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