High flux undulator beamline optics for EUV interferometry and photoemission microscopy

H. Raul Beguiristain; James H. Underwood; Masato Koike; Phillip J. Batson; Eric M. Gullikson; Keith H. Jackson; Hector Medecki; David T. Attwood Jr.

doi:10.1117/12.259828

21 November 1996 High flux undulator beamline optics for EUV interferometry and photoemission microscopy

H. Raul Beguiristain, James H. Underwood, Masato Koike, Phillip J. Batson, Eric M. Gullikson, Keith H. Jackson, Hector Medecki, David T. Attwood Jr.

Author Affiliations +

Proceedings Volume 2855, High Heat Flux Engineering III; (1996) https://doi.org/10.1117/12.259828
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

A long undulator installed at a low emittance storage ring, generates quasi-monochromatic beams of high brightness and partial coherence properties; however, this also raises concerns regarding high heat loads on beam line components. There have been intensive research efforts to develop beam line optics to exploit brightness and coherence properties from undulators. These components must withstand high heat loads produced by intense synchrotron radiation beams impinging on their surface which could degrade beam line performance. The effects of high flux undulator radiation on beam line optics for EUV interferometry and photoemission microscopy will be discussed. Specifically, beam line schematics, design considerations of indirectly side cooled mirror and grating assemblies developed at the Center for X- Ray Optics and recent data of performance under undulator radiation load from beam line BL12.0 being commissioned at the ALS will be presented in this study.

Citation Download Citation

H. Raul Beguiristain, James H. Underwood, Masato Koike, Phillip J. Batson, Eric M. Gullikson, Keith H. Jackson, Hector Medecki, and David T. Attwood Jr. "High flux undulator beamline optics for EUV interferometry and photoemission microscopy", Proc. SPIE 2855, High Heat Flux Engineering III, (21 November 1996); https://doi.org/10.1117/12.259828

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