Process of double-exposure interferogram formation on deformed surface of photothermoplastic media

Lev M. Panasiuk; Igor V. Ciapurin

doi:10.1117/12.251830

30 September 1996 Process of double-exposure interferogram formation on deformed surface of photothermoplastic media

Lev M. Panasiuk, Igor V. Ciapurin

Proceedings Volume 2851, Photopolymer Device Physics, Chemistry, and Applications III; (1996) https://doi.org/10.1117/12.251830
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

The study of double-exposure interferogram recording onto photothermoplastic media (PTPM) is carried out and the results are given. The peculiarities of surface relief development arising during the recording process with two charging cycles are determined. The practical recommendations are given to optimize the process of double-exposure interferogram recording onto PTPM.

Citation Download Citation

Lev M. Panasiuk and Igor V. Ciapurin "Process of double-exposure interferogram formation on deformed surface of photothermoplastic media", Proc. SPIE 2851, Photopolymer Device Physics, Chemistry, and Applications III, (30 September 1996); https://doi.org/10.1117/12.251830

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