Automatic photomask defect classification method

Kyoji Yamashita; Kazuto Matsuki; Kiminobu Akeno

doi:10.1117/12.245246

24 July 1996 Automatic photomask defect classification method

Kyoji Yamashita, Kazuto Matsuki, Kiminobu Akeno

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245246
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

This paper describes a new image-processing algorithm for classifying photomask defects as pindots or contamination as a step toward automated inspection equipment for the one-micron generation. To detect contamination on quartz, our method extracts the gradient of the transmitted image within the dark region of reflected image. Contamination on the opaque membrane can also be detected by using the same method but with the transmitted image and reflected image mutually transposed. Standard particles of 0.3 to 0.5 micron can be detected with particles on quartz and particles on opaque membrane separated.

Citation Download Citation

Kyoji Yamashita, Kazuto Matsuki, and Kiminobu Akeno "Automatic photomask defect classification method", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245246

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