PROCEEDINGS VOLUME 2793
SYMPOSIUM ON PHOTOMASK AND X-RAY MASK TECHNOLOGY | 18-19 APRIL 1996
Photomask and X-Ray Mask Technology III
Editor(s): Hideo Yoshihara
Editor Affiliations +
IN THIS VOLUME

8 Sessions, 53 Papers, 0 Presentations, 0 Posters
Equipment  (9)
Metrology  (2)
SYMPOSIUM ON PHOTOMASK AND X-RAY MASK TECHNOLOGY
18-19 April 1996
Kawasaki City, Japan
Photomask Process and Materials
Kotaro Shirabe, Eiichi Hoshino, Keiji Watanabe
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245208
Hiroichi Kawahira, Mikio Katsumata, Keisuke Tsudaka, Akihiro Ogura, Manabu Tomita, Satoru Nozawa
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245218
Phase-Shift Mask
Hyoungjoon Kim, Jongwook Kye, Dae-Yup Lee, Sang-Gyun Woo, Hoyoung Kang, Young-Bum Koh
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245224
Photomask Process and Materials
Jung-Min Sohn, Seong-Woon Choi, Byung Guk Kim, Hanku Cho, Hee-Sun Yoon
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245234
Phase-Shift Mask
Minoru Komada, Masa-aki Kurihara, Shiho Sasaki, Takamitsu Makabe, Naoya Hayashi
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245245
Suigen Kyoh, Hideaki Sakurai, Takayuki Iwamatsu, Akiko Yamada, Iwao Higashikawa
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245248
Photomask Process and Materials
Mikio Katsumata, Hiroichi Kawahira, Minoru Sugawara, Satoru Nozawa
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245249
Masks for X-Ray and E-Beam
Kurt R. Kimmel, Patrick J. Hughes
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245250
Kenji Marumoto, Hideki Yabe, Sunao Aya, Koji Kise, Seiichi Tanji, Nobuyuki Minami
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245198
Yasunao Saitoh, Takashi Ohkubo, Ikuo Okada, Misao Sekimoto, Tadahito Matsuda
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245199
Kinya Ashikaga, Shinji Tsuboi, Yoshio Yamashita, Shinji Sugihara, Yoshio Gomei, Tsutomu Shoki, Yoichi Yamaguchi, Tsuneaki Ohta
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245200
Katsuyuki Itoh, Hiroshi Yamashita, Takahiro Ema, Hiroshi Nozue
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245201
Photomask Process and Materials
Shinji Ishida, Shuichi Hashimoto, Tadao Yasuzato, Kunihiko Kasama
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245202
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245203
Phase-Shift Mask
Seungbum Hong, Eunah Kim, Zhong-Tao Jiang, Byeong-Soo Bae, Kwangsoo No, Woosuck Shin, Sung-Chul Lim, Sang-Gyun Woo, Young-Bum Koh
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245204
Photomask Process and Materials
Byung-Cheol Cha, Seong-Woon Choi, Jin-Min Kim, Hanku Cho, Jung-Min Sohn
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245205
Do Yon Kim, Y. I. Lee, W. S. Kim
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245206
Yasumasa Wada, Motofuni Kashiwagi, H. Tanaka, Atsushi Kawata, Kiyoto Tanaka, Yuhichi Yamamoto
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245207
Takao Higuchi, Hideo Kobayashi, Kazuhide Yamashiro, Keishi Asakawa, Yasunori Yokoya
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245209
Phase-Shift Mask
Yuhichi Fukushima, Nobuhiko Fukuhara, Kohsuke Ueyama
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245210
C. C. Cheng, T. B. Wu, J. Y. Gan, Laurent C. Tuo, Jia-Jing Wang
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245211
Y. S. Yan, C. C. Cheng, C. L. Lin, J. Y. Gan, T. B. Wu, Laurent C. Tuo, Jia-Jing Wang
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245212
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245213
Masks for X-Ray and E-Beam
Tsuneaki Ohta, Shuichi Noda, Masanori Kasai, Hiroshi Hoga
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245214
Ryo Ohkubo, Tsutomu Shoki, Hideaki Mitsui, Noromichi Annaka, Yoichi Yamaguchi
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245215
Hitoshi Noguchi, Meguru Kashida, Yoshihiro Kubota, Takayuki Takarada
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245216
Design Automation
Shigehiro Hara, Eiji Murakami, Shunko Magoshi, Kiyomi Koyama, Hirohito Anze, Yoji Ogawa, A. Kabeya, S. Ooki, Tamaki Saito, et al.
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245217
Robert Veltman, Isao Ashida
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245219
Yasunori Kanai, Toshiji Shimada, Kazunari Sekigawa, Makoto Nishi, Yasufumi Ishihara, Jun-ichi Mori, Satoshi Akutagawa, Kazuhiko Takahashi, Touru Miyauchi
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245220
Inspection and Repair
Kazuo Aita, Anto Yasaka, Tadashi Kitamura, Hiroshi Matsumura, Yasushi Satoh, Hiroshi Nakamura, Junji Fujikawa, Katsuhide Tsuchiya, Shigeru Noguchi
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245221
Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, T. Koike, Iwao Higashikawa
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245222
Jin-Hong Park, Hanku Cho, Yonghoon Kim, Kyung Hee Lee, Hee-Sun Yoon
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245223
James A. Reynolds, Franklin M. Schellenberg, Michael S. Hibbs, Dennis Hayden
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245225
Equipment
Hideo Takizawa, Haruhiko Kusunose, Naoki Awamura, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245226
Hiroshi Fujita, Hisatake Sano, Haruhiko Kusunose, Hideo Takizawa, Kouji Miyazaki, Naoki Awamura, Takahiro Ode, Daikichi Awamura
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245227
Masaru Morita, Shigeru Tachikawa, Mikio Iida
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245228
Takehiko Okada, H. Yamazaki, Yoji Tono-oka, Haruo Kinoshita
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245229
Design Automation
Hiroomi Nakao, Koichi Moriizumi, Kinya Kamiyama, Masayuki Terai, Hisaharu Miwa
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245230
Pelliclization
Motofuni Kashiwagi, Hitomi Matsuzaki, Norio Nakayama
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245231
Toru Shirasaki, Meguru Kashida, Yoshihiro Kubota
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245232
Equipment
Frank E. Abboud, David W. Alexander, Thomas P. Coleman, Allen Cook, Leonard Gasiorek, Robert J. Naber, Frederick Raymond, Charles A. Sauer
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245233
Kazui Mizuno, Katsuhiro Kawasaki, Hiroyuki Itoh, Hidetoshi Satoh, Yasuhiro Someda, Norio Saitou
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245235
Sheldon M. Kugelmass, Joseph Mitchell, John T. Poreda
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245236
Tsutoma Haneda, Tetsuya Shimanaka, Koji Wakabayashi, Yoichi Yoshino
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245237
Klony S. Lieberman, Hanan Terkel, Michael Rudman, A. Ignatov, Aaron Lewis
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245238
Metrology
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245239
Giang T. Dao, Gang Liu, Alan Snyder, Jeff N. Farnsworth
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245240
Inspection and Repair
Yasuhiro Koizumi, Daniel L. Lopez
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245241
Haruhiko Kusunose, Naoki Awamura, Hideo Takizawa, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245242
Yair Eran, Nissim Elmaliach, Yonatan Lehaman, Eyal Mizrahi, Gideon Rossman
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245243
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245244
Kyoji Yamashita, Kazuto Matsuki, Kiminobu Akeno
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245246
Tsuneyuki Hagiwara, Kouichirou Komatsu
Proceedings Volume Photomask and X-Ray Mask Technology III, (1996) https://doi.org/10.1117/12.245247
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