Applications of neural networks in IC lithography

Manisha Mahendra; Thomas F. Krile

doi:10.1117/12.235960

22 March 1996 Applications of neural networks in IC lithography

Manisha Mahendra, Thomas F. Krile

Proceedings Volume 2760, Applications and Science of Artificial Neural Networks II; (1996) https://doi.org/10.1117/12.235960
Event: Aerospace/Defense Sensing and Controls, 1996, Orlando, FL, United States

Abstract

This paper will present two types of neural networks applied to IC lithography: the feedforward network with backpropagation and the abductive information modeling (polynomial) network. The inputs are various desired photoresist mask patterns while the corresponding outputs are the parameters that are used to generate these patterns. Results are shown for the 1D case with three exposures made while varying different combinations of two of the three parameters, amplitude, period and phase. Tradeoffs between the two types of networks when applied to this application are discussed.

Citation Download Citation

Manisha Mahendra and Thomas F. Krile "Applications of neural networks in IC lithography", Proc. SPIE 2760, Applications and Science of Artificial Neural Networks II, (22 March 1996); https://doi.org/10.1117/12.235960

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