High-power KrF excimer laser with a solid state switch for microlithography

Hakaru Mizoguchi; Noritoshi Ito; Hiroaki Nakarai; Yukio Kobayashi; Yasuo Itakura; Hiroshi Komori; Osamu Wakabayashi; Taketo Aruga; Takashi Sakugawa; Takehisa Koganezawa

doi:10.1117/12.240945

7 June 1996 High-power KrF excimer laser with a solid state switch for microlithography

Hakaru Mizoguchi, Noritoshi Ito, Hiroaki Nakarai, Yukio Kobayashi, Yasuo Itakura, Hiroshi Komori, Osamu Wakabayashi, Taketo Aruga, Takashi Sakugawa, Takehisa Koganezawa

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240945
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

New KrF excimer laser for microlithography KLES-G7 with a new simple solid state pulsed power circuit (SPC) is developed. This SPC has several advantages such as less maintenance cost and the higher reliability. The laser realizes 7.5W with 0.8 bandwidth, 600 Hz, 10mJ. The performance and the stability of the laser is demonstrated. The maintenance interval of the SPC is more than 10 X 10⁹ pulse. The KLES-G7 reduces 20 percent of the photon cost compared with the old model. It will accelerate the mass production of after 64Mbit DRAM.

Citation Download Citation

Hakaru Mizoguchi, Noritoshi Ito, Hiroaki Nakarai, Yukio Kobayashi, Yasuo Itakura, Hiroshi Komori, Osamu Wakabayashi, Taketo Aruga, Takashi Sakugawa, and Takehisa Koganezawa "High-power KrF excimer laser with a solid state switch for microlithography", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240945

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