Fabrication of submicrometer grating by holographic lithography and shadow deposition of metal or insulator layers

Lolita G. Rotkina; Alexander V. Lunev; Vladimir B. Smirnitskii; Denis A. Prestinskii

doi:10.1117/12.240964

7 June 1996 Fabrication of submicrometer grating by holographic lithography and shadow deposition of metal or insulator layers

Lolita G. Rotkina, Alexander V. Lunev, Vladimir B. Smirnitskii, Denis A. Prestinskii

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240964
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The grating resist patterns with period of 0.235-0.400 micrometers were fabricated by means of the holographic lithography with Ar laser (351.1 nm). The ordinary photoresists AZ-1350 and AZ-5214 were used. These gratings were used as the masks for the usual reactive ion etching as well as the complex substrates for the generation of the submicron metal grating patterns.

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Lolita G. Rotkina, Alexander V. Lunev, Vladimir B. Smirnitskii, and Denis A. Prestinskii "Fabrication of submicrometer grating by holographic lithography and shadow deposition of metal or insulator layers", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240964

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