Manipulation of the thermal properties of positive DUV polymers

Roger F. Sinta; George G. Barclay; Timothy G. Adams; David R. Medeiros

doi:10.1117/12.241822

14 June 1996 Manipulation of the thermal properties of positive DUV polymers

Roger F. Sinta, George G. Barclay, Timothy G. Adams, David R. Medeiros

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241822
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The thermal properties of the blocked polymers used in chemically amplified positive DUV photoresists are critical in determining ultimate resist performance as well as in the selection of processing parameters. Recently it has been shown that baking these resists at or above the glass transition temperature (T_g) significantly improves the delay stability of the resist. However in order to utilize this annealing concept two thermal properties, the T_g and the thermal decomposition temperature (T_d), of the blocked polymer must be controlled.

Citation Download Citation

Roger F. Sinta, George G. Barclay, Timothy G. Adams, and David R. Medeiros "Manipulation of the thermal properties of positive DUV polymers", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241822

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