HF overtone chemical laser technology

Bruce Rusty Graves; William Anthony Duncan; Stanley P. Patterson; Gordon N. Yonehara; John Waypa

doi:10.1117/12.236890

29 March 1996 HF overtone chemical laser technology

Bruce Rusty Graves, William Anthony Duncan, Stanley P. Patterson, Gordon N. Yonehara, John Waypa

Proceedings Volume 2702, Gas and Chemical Lasers; (1996) https://doi.org/10.1117/12.236890
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

This paper describes an effort in which a new generation of HF/DF/HF-OT laser nozzle technology has been developed. Among its objectives is to demonstrate scalability in intermediate laser module size through the Overtone Research Advanced Chemical Laser (ORACL), demonstrate a high power HF Overtone device that can operate in the HF fundamental and DF modes, and to demonstrate uncooled resonator optics at each level. The advancement in the laser nozzle technology improves the laser power density (kW/cm₂), improves the laser specific power (kW/kJ reactant) and simplifies manufacturing, An intermediate sized module has been completed, called ORACL, that could serve is a water cooled laser workhorse along with its associated uncooled optics for the resonator. An operational concept for a regeneratively gas cooled module has been analyzed an is ready for design. This paper will specifically discuss the design, completion and availability of the ORACL module along with its associated uncooled optics.

Citation Download Citation

Bruce Rusty Graves, William Anthony Duncan, Stanley P. Patterson, Gordon N. Yonehara, and John Waypa "HF overtone chemical laser technology", Proc. SPIE 2702, Gas and Chemical Lasers, (29 March 1996); https://doi.org/10.1117/12.236890

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