Infrared-laser-induced decomposition of tetravinylsilane for deposition of SixC1-x coatings

V. Drinek; Z. Bastl; J. Subrt; M. Urbanova; Josef Pola

doi:10.1117/12.203532

8 March 1995 Infrared-laser-induced decomposition of tetravinylsilane for deposition of Si_xC_1-x coatings

V. Drinek, Z. Bastl, J. Subrt, M. Urbanova, Josef Pola

Proceedings Volume 2461, ROMOPTO '94: Fourth Conference in Optics; (1995) https://doi.org/10.1117/12.203532
Event: ROMOPTO '94: 4th Conference on Optics, 1994, Bucharest, Romania

Abstract

CO₂ laser induced infrared multiphoton decomposition of tetravinylsilane affords a variety of gaseous hydrocarbons and Si/C/H films wherein the relative content of Si and C is affected by the temperature of the substrate.

Citation Download Citation

V. Drinek, Z. Bastl, J. Subrt, M. Urbanova, and Josef Pola "Infrared-laser-induced decomposition of tetravinylsilane for deposition of Si_xC_1-x coatings", Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); https://doi.org/10.1117/12.203532

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