UV radiometry issues for UV stabilization of photoresist

Jianou Shi; Steven Paul Grindle; Sharine Chen; Greg Owen; Linda J. Insalaco; Christopher L. Cromer; Laurie S. Goldner

doi:10.1117/12.209247

26 May 1995 UV radiometry issues for UV stabilization of photoresist

Jianou Shi, Steven Paul Grindle, Sharine Chen, Greg Owen, Linda J. Insalaco, Christopher L. Cromer, Laurie S. Goldner

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209247
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The use of intense, broadband, ultraviolet (UV) radiation in the stabilization of photoresist requires stable UV sources and sensors, as well as suitable calibration procedures. We have constructed and measured the stability of a new UV transfer source standard with a spectrum that is identical to that of a commercially available photostabilizer. This device is particularly useful in calibrating the broadband UV detectors that monitor photostabilizer irradiance. The irradiance of this new source in a narrow band around 310 nm is monitored and found to be stable to better than 1.5% over 12 days. Spectral measurements of the source are also presented. The stability of two other commercially available UV sources is investigated and the behavior of the broadband UV sensors is discussed.

Citation Download Citation

Jianou Shi, Steven Paul Grindle, Sharine Chen, Greg Owen, Linda J. Insalaco, Christopher L. Cromer, and Laurie S. Goldner "UV radiometry issues for UV stabilization of photoresist", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209247

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