Practical evaluation of optical-proximity effect correction by EDM methodology

Minoru Sugawara; Hiroichi Kawahira; Keisuke Tsudaka; Satoru Nozawa

doi:10.1117/12.209253

26 May 1995 Practical evaluation of optical-proximity effect correction by EDM methodology

Minoru Sugawara, Hiroichi Kawahira, Keisuke Tsudaka, Satoru Nozawa

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209253
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Practical evaluation method for optical proximity effect correction (OPC) feasibility is newly proposed using EDM (Exposure-Defocus and Mask fabrication latitude) methodology. In this method, printed image on a wafer is characterized by process latitude functions derived from EDM methodology in terms of exposure latitude, depth of focus, and mask line width latitude. In this paper, effectiveness of the process latitude functions will be verified by applying them to intraproximity effect evaluation for isolated lines and angled lines, and also to interproximity effect evaluation for T-shaped patterns and lines & spaces (L/S) patterns in i-line lithography.

Citation Download Citation

Minoru Sugawara, Hiroichi Kawahira, Keisuke Tsudaka, and Satoru Nozawa "Practical evaluation of optical-proximity effect correction by EDM methodology", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209253

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