Improvement of the ArF laser for photolithography

Alexander N. Novoselov; Boris A. Konstantinov; Victor G. Nikiforov; Boris F. Trinchuk

doi:10.1117/12.209248

26 May 1995 Improvement of the ArF laser for photolithography

Alexander N. Novoselov, Boris A. Konstantinov, Victor G. Nikiforov, Boris F. Trinchuk

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209248
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

With the aim of improving output parameters and operating characteristics of ArF excimer laser intended for submicrolithography intracavity Fabry-Perot etalons able to effectively narrow and tune laser radiation were developed and tested. Used in an YYE 1702 compact excimer laser two innovative etalons permitted to achieve maximum output energy of 5 mJ at 193,3 nm, bandwidth of 20 pm and 0.5 level for 8 ns pulse duration, 20 X 5 mm output beam aperture, 100 Hz pulse repetition rate. The dispersive resonator shows high energy efficiency.

Citation Download Citation

Alexander N. Novoselov, Boris A. Konstantinov, Victor G. Nikiforov, and Boris F. Trinchuk "Improvement of the ArF laser for photolithography", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209248

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available