Contributions of stepper lenses to systematic CD errors within exposure fields

Hua-Yu Liu; Crid Yu; Robert E. Gleason

doi:10.1117/12.209312

26 May 1995 Contributions of stepper lenses to systematic CD errors within exposure fields

Hua-Yu Liu, Crid Yu, Robert E. Gleason

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209312
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

We have studied systematic line width (CD) errors as functions of field coordinates for three late-model i-line steppers from different manufacturers by measuring electrical resistance of lines patterned in poly-silicon. The combination of reticle errors with non-linear imaging accounts for a significant fraction of the total line width errors. After removing the effects of reticle errors, CD contour maps are consistent with aberration patterns in which the Strehl intensity is highest at the center of the field.

Citation Download Citation

Hua-Yu Liu, Crid Yu, and Robert E. Gleason "Contributions of stepper lenses to systematic CD errors within exposure fields", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209312

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