Effect of numerical aperture and partial coherence on i-line swing curve amplitude at sub-half-micrometer resolution

Brian Martin; Graham G. Arthur

doi:10.1117/12.209232

22 May 1995 Effect of numerical aperture and partial coherence on i-line swing curve amplitude at sub-half-micrometer resolution

Brian Martin, Graham G. Arthur

Author Affiliations +

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209232
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

'Swing curves' derived from the modelling program SOLID are presented for a typical conventional i-line resist. At a constant sub-half-micron feature size, results illustrate the effect of varying stepper lens conditions on 'swing curve' amplitude and indicate that, whilst initially defined by reflectivities, resist thickness and resist absorption coefficient, it increases as aerial image peak intensity decreases. 'Swing curves' are drawn in terms of exposure-to-size vs resist thickness which has the advantage of always producing complete plots.

Citation Download Citation

Brian Martin and Graham G. Arthur "Effect of numerical aperture and partial coherence on i-line swing curve amplitude at sub-half-micrometer resolution", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209232

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