Laser-induced damage in optical materials under UV excimer laser radiation

Nikolay V. Morozov

doi:10.1117/12.213751

14 July 1995 Laser-induced damage in optical materials under UV excimer laser radiation

Nikolay V. Morozov

Proceedings Volume 2428, Laser-Induced Damage in Optical Materials: 1994; (1995) https://doi.org/10.1117/12.213751
Event: Laser-Induced Damage in Optical Materials: 1994, 1994, Boulder, CO, United States

Abstract

The studies of laser damage resistance of silica glass and fluoride crystals performed at ArF, KrF, and XeF excimer laser wavelengths with a pulse duration of approximately 80 ns have given the following data: the dependence of the bulk damage threshold on irradiated spot size, ranging in value from 6 to 1200 micrometers ; temperature dependence of laser damage resistance; the influence of metal admixtures on damage threshold; the influence of ionizing radiation on damage resistance; the coefficients of nonlinear absorption; frequency dependence of the bulk damage threshold for silica glass in the UV region.

Citation Download Citation

Nikolay V. Morozov "Laser-induced damage in optical materials under UV excimer laser radiation", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213751

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available