Structural studies of Mo/Si multilayers by EXAFS

Shiqiang Wei; Liwen Wu; Jie Bai; Chen Gao; Wenhan Liu

doi:10.1117/12.190781

26 October 1994 Structural studies of Mo/Si multilayers by EXAFS

Shiqiang Wei, Liwen Wu, Jie Bai, Chen Gao, Wenhan Liu

Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190781
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China

Abstract

EXAFS was used to investigate the structures of Mo/Si multilayers from 20 angstrom to 3000 angstrom period value. The results show the structural disorder of Mo atom neighbor environment was inreased while the thickness of Mo layer was thinner. For 20 angstrom and 50 angstrom period Mo/Si multilayers, the polycrystalline Mo layer vanish, the intended small period structure were destroyed by interdiffusion. The mixed layer is amorphous MoSi₂. EXAFS results confirm that there is a critical difficulty in fabricating small period Mo/Si multilayer with a high reflectivity.

Citation Download Citation

Shiqiang Wei, Liwen Wu, Jie Bai, Chen Gao, and Wenhan Liu "Structural studies of Mo/Si multilayers by EXAFS", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); https://doi.org/10.1117/12.190781

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