Epitaxial CoSi2 film grown on Si substrate by solid interaction of Co/Ti/Si and TiN/Co/Ti/Si multilayer

Wei-Jun Wu; Bing-Zong Li; Kai Shao; Z. Sun; Zhi Guang Gu; Wei-Ning Huang; Guo Bao Jiang; Ping Liu; Zu Yao Zhou

doi:10.1117/12.190809

26 October 1994 Epitaxial CoSi₂ film grown on Si substrate by solid interaction of Co/Ti/Si and TiN/Co/Ti/Si multilayer

Wei-Jun Wu, Bing-Zong Li, Kai Shao, Z. Sun, Zhi Guang Gu, Wei-Ning Huang, Guo Bao Jiang, Ping Liu, Zu Yao Zhou

Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190809
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China

Abstract

CoSi₂ is being investigated intensively for microelectronics application recently. In this paper a new method of growing an epitaxial CoSi₂ film by solid state reaction of Co/Ti/Si and TiN/Co/Ti/Si multilayer is described. The variation of structure and sheet resistance of the film with thermal annealing temperature and time has bee investigated. The kinetics and mechanism of the CoSi₂ solid-state epitaxy are discussed.

Citation Download Citation

Wei-Jun Wu, Bing-Zong Li, Kai Shao, Z. Sun, Zhi Guang Gu, Wei-Ning Huang, Guo Bao Jiang, Ping Liu, and Zu Yao Zhou "Epitaxial CoSi₂ film grown on Si substrate by solid interaction of Co/Ti/Si and TiN/Co/Ti/Si multilayer", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); https://doi.org/10.1117/12.190809

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