Amorphous silicon nitride binary-phase optical elements

Xinfan Huang; Wenqi Gao; Zhifeng Li; Xiaofeng Gu; Jin Zhou; Kun-Ji Chen

doi:10.1117/12.190750

26 October 1994 Amorphous silicon nitride binary-phase optical elements

Xinfan Huang, Wenqi Gao, Zhifeng Li, Xiaofeng Gu, Jin Zhou, Kun-Ji Chen

Proceedings Volume 2364, Second International Conference on Thin Film Physics and Applications; (1994) https://doi.org/10.1117/12.190750
Event: Thin Film Physics and Applications: Second International Conference, 1994, Shanghai, China

Abstract

We report a new type of binary-phase optical beam splitters combined with a two-dimensional Dammann grating and a Fresnel zone plate as one element which has both functions of beam splitting and focussing. Amorphous silicon nitride (a-SiN_x:H) thin films deposited by plasma enhanced chemical vapor deposition (PECVD) method have been used for fabricating such an optical element. We have obtained 3 X 3 arrays of equal intensity and focused beams which generated by the beam splitter based on our own design. The relative distribution error of the intensity in each beam of the array is less than 5%.

Citation Download Citation

Xinfan Huang, Wenqi Gao, Zhifeng Li, Xiaofeng Gu, Jin Zhou, and Kun-Ji Chen "Amorphous silicon nitride binary-phase optical elements", Proc. SPIE 2364, Second International Conference on Thin Film Physics and Applications, (26 October 1994); https://doi.org/10.1117/12.190750

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