Thin film and surface layer processes forming control using electron emission

Yuri Dekhtyar; A. Kunitzin; Vladimir Noskov

doi:10.1117/12.186785

16 September 1994 Thin film and surface layer processes forming control using electron emission

Yuri Dekhtyar, A. Kunitzin, Vladimir Noskov

Proceedings Volume 2336, Manufacturing Process Control for Microelectronic Devices and Circuits; (1994) https://doi.org/10.1117/12.186785
Event: Microelectronic Manufacturing, 1994, Austin, TX, United States

Abstract

Physical reasons providing sensitivity of a photoemission current to a thicknesses of a thin film and a doped surface layer are considered. Both a difference between optical properties of a substrata and a film coated on it and dependence of photoelectric work function on electrical active admixture concentration are the main of them. Photoelectron emission has been applied to test objects having the thickness in order to 10² angstroms.

Citation Download Citation

Yuri Dekhtyar, A. Kunitzin, and Vladimir Noskov "Thin film and surface layer processes forming control using electron emission", Proc. SPIE 2336, Manufacturing Process Control for Microelectronic Devices and Circuits, (16 September 1994); https://doi.org/10.1117/12.186785

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