Paper
5 August 1994 Electronic speckle pattern shearing interferometry (ESPSI) and its applications
Wolfgang Steinchen, Lian Xiang Yang, M. Schuth, Gerhard Kupfer
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Proceedings Volume 2321, Second International Conference on Optoelectronic Science and Engineering '94; (1994) https://doi.org/10.1117/12.182119
Event: Optoelectronic Science and Engineering '94: International Conference, 1994, Beijing, China
Abstract
Since speckle pattern shearing interferometry (SPSI) allows derivatives of surface displacement to be measured directly, it is very useful for non-destructive testing and strain analysis. In conventional SPSI, observation of fringes requires an optical processing of double- exposed interferograms and therefore, this technique is not in real time. This paper presents the development of the SPSI, that is, the technique of electronic speckle pattern shearing interferometry, which enables the shearing interferometric fringes to be observed in real time and to be evaluated quantitatively. Its relevant theory is described and a few applications are also shown in this paper.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wolfgang Steinchen, Lian Xiang Yang, M. Schuth, and Gerhard Kupfer "Electronic speckle pattern shearing interferometry (ESPSI) and its applications", Proc. SPIE 2321, Second International Conference on Optoelectronic Science and Engineering '94, (5 August 1994); https://doi.org/10.1117/12.182119
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