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Hardness of TiO2-MgF2 and TiO2-SiO2 composite films prepared by reactive ion-assisted coevaporation were strongly dependent on the microstructures and evaporation rates of each component. The softening of the composite films at low TiO2 composition is caused by the dispersion of amorphous TiO2 particles in the sort amorphous SiO2 or soft crystalline MgF2 matrix, which is obtained at the high evaporation rate of SiO2 or MgF2. In contrast, the hardening of the composite films at high TiO2 composition is produced by the dispersion of hard amorphous SiO2particles or hard crystalline MgF2 grains with the size <20 nm within the amorphous TiO2matrix, which is obtained at the low evaporation rate of SiO2 or MgF2. In these cased, the evaporation rate of TiO2 is always maintained at 0.2 nm/s.
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Rung-Ywan Tsai, Fang Chung Ho, "Study on the hardness of composite films prepared by ion-assisted co-evaporation process," Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192146