Binary optics for optical interconnects

Steven M. Shank; Harold G. Craighead

doi:10.1117/12.177332

3 June 1994 Binary optics for optical interconnects

Steven M. Shank, Harold G. Craighead

Proceedings Volume 2216, Photonics at the Air Force Photonics Center; (1994) https://doi.org/10.1117/12.177332
Event: SPIE's International Symposium on Optical Engineering and Photonics in Aerospace Sensing, 1994, Orlando, FL, United States

Abstract

Four- and eight-level diffractive optical elements (DOES) are fabricated in silicon using electron beam lithography and reactive ion etching. An f/1.9. 1-mm diameter, four-phase level, reflective off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first-order efficiency of the DOE is 73%. Eight-level linear gratings are fabricated to determine processing tolerances for DOEs with first order-diffraction efficiencies greater than 90%.

Citation Download Citation

Steven M. Shank and Harold G. Craighead "Binary optics for optical interconnects", Proc. SPIE 2216, Photonics at the Air Force Photonics Center, (3 June 1994); https://doi.org/10.1117/12.177332

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