Practical 0.35-um i-line lithography

Paul Frank Luehrmann Jr.; Stefan Wittekoek; Steven G. Hansen

doi:10.1117/12.175435

17 May 1994 Practical 0.35-um i-line lithography

Paul Frank Luehrmann Jr., Stefan Wittekoek, Steven G. Hansen

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175435
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

The push to achieve higher density devices continues to place tremendous demands on optical lithography. Several techniques have been used to achieve 0.35 micrometers feature sizes. This paper presents data on the practical application of numerical aperture (NA) and partial (sigma) for 0.35 micrometers imaging. A number of conventional photoresist systems are characterized at various NA/(sigma) . Important differences in the response of photoresists have been observed. These are quantified with respect to various types of structures. Of particular interest are the affects on dense lines and contact structures. The affect of bias also is quantified by using a special reticle where pitch is held constant and the chrome linewidth is varied to determine optimal process latitude. After examining the imaging performance of a few high-contrast photoresists, the use of normalized image log-slope (NILS) is applied for two stepper conditions. Finally, response curves are generated to show optimal exposure conditions for resolution and depth of focus versus NA/(sigma) performance for a number of different NILS photoresists.

Citation Download Citation

Paul Frank Luehrmann Jr., Stefan Wittekoek, and Steven G. Hansen "Practical 0.35-um i-line lithography", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175435

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photoresist materials

Nanoimprint lithography

Reticles

Photoresist processing

Semiconducting wafers

Image processing

Lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years