Correlation of optical, x-ray, and electron microscopy measurements on semiconductor multilayer structures

David H. Christensen; Robert K. Hickernell; David T. Schaafsma; Joseph G. Pellegrino; Mark J. McCollum; James R. Hill; R. S. Rai

doi:10.1117/12.176851

26 May 1994 Correlation of optical, x-ray, and electron microscopy measurements on semiconductor multilayer structures

David H. Christensen, Robert K. Hickernell, David T. Schaafsma, Joseph G. Pellegrino, Mark J. McCollum, James R. Hill, R. S. Rai

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Proceedings Volume 2141, Spectroscopic Characterization Techniques for Semiconductor Technology V; (1994) https://doi.org/10.1117/12.176851
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

Techniques based on optical, x ray, and electron microscopy measurements are applied to characterized a wide variety of semiconductor multilayer structures. Bragg mirrors serve as valuable test structures for evaluating the epitaxial uniformity of crystal growth systems. Careful characterization of half-wave space single quantum wells provides a method for determining their complex refractive indices using reflectance spectroscopy. Comparison of cross-sectional microphotoluminescence to surface-normal photoluminescence, combined with these characterization techniques, allows studies of spontaneous emission in microcavities and elucidates the difficulties with using surface-normal photoluminescence to determine the alloy composition of the mirror layers. The application of these characterization methods to visible- wavelength AlGaAs mirrors, 485-720 nm, enables the development of these mirrors for uses such as optically tailored substrates and visible surface-emitter or detector arrays.

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David H. Christensen, Robert K. Hickernell, David T. Schaafsma, Joseph G. Pellegrino, Mark J. McCollum, James R. Hill, and R. S. Rai "Correlation of optical, x-ray, and electron microscopy measurements on semiconductor multilayer structures", Proc. SPIE 2141, Spectroscopic Characterization Techniques for Semiconductor Technology V, (26 May 1994); https://doi.org/10.1117/12.176851

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KEYWORDS

Quantum wells

Reflectivity

Mirrors

Reflectors

Vertical cavity surface emitting lasers

X-rays

Reflectance spectroscopy

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