Manufacture of diffractive structure in Sb2S3 film by pulse laser irradiation

Zoya N. Kalyashova; Vladimir E. Sabinin; V. I. Korolev; E. P. Mesnyankin

doi:10.1117/12.165364

10 December 1993 Manufacture of diffractive structure in Sb₂S₃ film by pulse laser irradiation

Zoya N. Kalyashova, Vladimir E. Sabinin, V. I. Korolev, E. P. Mesnyankin

Proceedings Volume 2108, International Conference on Holography, Correlation Optics, and Recording Materials; (1993) https://doi.org/10.1117/12.165364
Event: Holography, Correlation Optics, and Recording Materials, 1993, Chernivsti, Ukraine

Abstract

The semiconductor film Sb₂S₃, deposited on the glass and metal substrates, has been used as a recording material when fabricating diffraction gratings by pulse laser irradiation of 0.53 and 1.06 micrometers . The processes of photothermal ablation are the basis for the mechanism of diffraction structure formation. The gratings at spatial frequencies of 100, 500, and 800 mm^-1 have been fabricated without postexposure treatment by pulse laser irradiation of 20 and 1000 ns in duration. The diffraction efficiency of the manufactured gratings for different exposure energy densities has been measured.

Citation Download Citation

Zoya N. Kalyashova, Vladimir E. Sabinin, V. I. Korolev, and E. P. Mesnyankin "Manufacture of diffractive structure in Sb₂S₃ film by pulse laser irradiation", Proc. SPIE 2108, International Conference on Holography, Correlation Optics, and Recording Materials, (10 December 1993); https://doi.org/10.1117/12.165364

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