Integrated system of optical sensors for plasma monitoring and plasma process control

Harold M. Anderson; Michael P. Splichal

doi:10.1117/12.167366

15 February 1994 Integrated system of optical sensors for plasma monitoring and plasma process control

Harold M. Anderson, Michael P. Splichal

Proceedings Volume 2091, Microelectronic Processes, Sensors, and Controls; (1994) https://doi.org/10.1117/12.167366
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

Real-time plasma etch process monitoring, based on sensors which measure plasma properties which directly relate to the desired wafer features, is critical to the future competitiveness of the U.S. microelectronics industry. This study reports work developing new optical sensors which would serve as a feedback loop for plasma process control by researchers at the University of New Mexico (UNM). The aim of the research, funded by the industry/government consortium known as SEMATECH, is to create a nonperturbing sensor which exploits the information on process results (e.g. etch rate, uniformity, selectivity, etc.) present in plasma optical emission spectra. Both continuing work at UNM and new work at Lam Research Corp. are presented.

Citation Download Citation

Harold M. Anderson and Michael P. Splichal "Integrated system of optical sensors for plasma monitoring and plasma process control", Proc. SPIE 2091, Microelectronic Processes, Sensors, and Controls, (15 February 1994); https://doi.org/10.1117/12.167366

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