Confinement effects of oxide overlayers on the stress and yield behavior of Al alloys

Steven G.H. Anderson; I. S. Yeo; D. Jawarani; Paul S. Ho; Sesh Ramaswami; Robin Cheung

doi:10.1117/12.156517

15 September 1993 Confinement effects of oxide overlayers on the stress and yield behavior of Al alloys

Steven G.H. Anderson, I. S. Yeo, D. Jawarani, Paul S. Ho, Sesh Ramaswami, Robin Cheung

Proceedings Volume 2090, Multilevel Interconnection: Issues That Impact Competitiveness; (1993) https://doi.org/10.1117/12.156517
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

The effect of oxide confinement on the stress and yield behavior of AlCuSi and AlCu films on oxidized Si substrates have been measured by bending beam techniques and examined using a film strength model. Our results reveal that the oxide thickness, alloy thickness, and metal grain size play a role in determining the plastic deformation behavior of the metal films above approximately 200 degree(s)C. The stress analysis of multilayers for bending beam measurements has been extended to include plastic deformation, making it possible to directly determine the effects of the oxide overlayer on the stress and yield behavior of the Al alloy film. Complementary transmission electron microscopy (TEM) studies of the Al alloy reveal that differences in the grain size with and without a SiO₂ passivation layer are central to determining whether an increase in film strength due to the passivation oxide will be observable. The overall experimental results, particularly the contrasting effects observed for AlCuSi and AlCu films, can be satisfactorily accounted for by a film strength model which takes into account the roles of film thickness, oxide thickness, and grain size in controlling the yield strength.

Citation Download Citation

Steven G.H. Anderson, I. S. Yeo, D. Jawarani, Paul S. Ho, Sesh Ramaswami, and Robin Cheung "Confinement effects of oxide overlayers on the stress and yield behavior of Al alloys", Proc. SPIE 2090, Multilevel Interconnection: Issues That Impact Competitiveness, (15 September 1993); https://doi.org/10.1117/12.156517

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