KrF excimer lasers for DUV-lithography

Rainer Paetzel; Hermann Buecher; Ulrich Rebhan

doi:10.1117/12.150468

8 August 1993 KrF excimer lasers for DUV-lithography

Rainer Paetzel, Hermann Buecher, Ulrich Rebhan

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150468
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The paper presents the features of the Lambda Physik 248 LEX KrF DUV-Lithography laser for spectral performance, reliability, and system integration. The 248 LEX is based on Lambda Physik's series of `LAMBDA' industrial lasers. Data of 5 years field experience with the LAMBDA high power industrial lasers are used to discuss reliability of the laser in and economic aspects of the laser application in terms of cost-of-ownership. Results of an endurance test program for lithography lasers are used to given an outlook on system performance and component lifetime. Based on these data the cost-of-ownership is projected for the coming years and multiple system installations. An update of Lambda Physiks' R&D effort and recent progress is given.

Citation Download Citation

Rainer Paetzel, Hermann Buecher, and Ulrich Rebhan "KrF excimer lasers for DUV-lithography", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150468

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