Design and development of a prototype excimer-laser-based stepper

Dohoon Kim; Boo-Yeon Choi; Ki Ro Chung; Chi-Hoon Jun; Won-Ick Jang; Youn Tae Kim; Jong-Hyun Lee; Heung Ok Park

doi:10.1117/12.150486

8 August 1993 Design and development of a prototype excimer-laser-based stepper

Dohoon Kim, Boo-Yeon Choi, Ki Ro Chung, Chi-Hoon Jun, Won-Ick Jang, Youn Tae Kim, Jong-Hyun Lee, Heung Ok Park

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150486
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

This paper describes the design and development of a KrF excimer laser stepper and discusses the detailed system parameters and characterization data obtained from the performance test. We have developed a deep UV step-and-repeat system, operating at 248 nm, by retrofitting commercial modules such as a KrF excimer laser, precision wafer stage and fused silica illumination and 5X projection optics of numerical aperture 0.42. What we have developed, to the basic structure, are wafer alignment optics, reticle alignment system, autofocusing/leveling mechanisms and an environment chamber. Finally, all these subsystems were integrated under the control of microprocessor-based controllers and a computer.

Citation Download Citation

Dohoon Kim, Boo-Yeon Choi, Ki Ro Chung, Chi-Hoon Jun, Won-Ick Jang, Youn Tae Kim, Jong-Hyun Lee, and Heung Ok Park "Design and development of a prototype excimer-laser-based stepper", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150486

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