Phase image metrology with a modified coherence probe microscope

Diana Nyyssonen; Joel L. Seligson; Isaac Mazor

doi:10.1117/12.149020

4 August 1993 Phase image metrology with a modified coherence probe microscope

Diana Nyyssonen, Joel L. Seligson, Isaac Mazor

Author Affiliations +

Proceedings Volume 1926, Integrated Circuit Metrology, Inspection, and Process Control VII; (1993) https://doi.org/10.1117/12.149020
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Bright field optical microscopy has well-known nonlinearity problems due to varying film thickness. Phase images eliminate many of these problems. This paper will describe the advantages of phase imaging, based on calculated results. Experimental corroboration has been obtained with a bimodal coherence probe microscope. In the less coherent mode, the microscope utilizes illumination with a high numerical aperture and broad spectral bandwidth. In the coherent mode, the illumination is monochromatic and has a low numerical aperture. Experimental data will be presented and compared to theoretical results. The system demonstrates extended resolution for some materials and a reduced sensitivity to substrate variations.

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Diana Nyyssonen, Joel L. Seligson, and Isaac Mazor "Phase image metrology with a modified coherence probe microscope", Proc. SPIE 1926, Integrated Circuit Metrology, Inspection, and Process Control VII, (4 August 1993); https://doi.org/10.1117/12.149020

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