Simulation of self-diffusion effects of silylated polymers during dry development

Ulrich A. Jagdhold; Hartmut H. Erzgraeber

doi:10.1117/12.154805

15 September 1993 Simulation of self-diffusion effects of silylated polymers during dry development

Ulrich A. Jagdhold, Hartmut H. Erzgraeber

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154805
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A model is presented to study self diffusion effects of silylated polymers during dry development. The effect is discussed in connection with mechanisms of the formation of the oxide mask during different O₂-RIE conditions. Furthermore, the influence on the CD control is outlined.

Citation Download Citation

Ulrich A. Jagdhold and Hartmut H. Erzgraeber "Simulation of self-diffusion effects of silylated polymers during dry development", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154805

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