Effects of fluorescence on the spatial resolution of photoresist materials

J. J. M. Vleggaar; A. H. Huizer; Cyril A.G.O. Varma

doi:10.1117/12.154783

15 September 1993 Effects of fluorescence on the spatial resolution of photoresist materials

J. J. M. Vleggaar, A. H. Huizer, Cyril A.G.O. Varma

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154783
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Five-substituted diazo-naphthoquinones (DNQs) are photolyzed in novolac and in various solvents in the presence of H₂O. HPLC analysis reveals that, depending on the matrix or the solvent, a large fraction of the DNQ is converted into products other than indene carboxylic acid (ICA). These include products from fragmentation, dimerization, and azo- coupling as well as products from the reaction of the solvent with intermediates in the main photoreaction. A larger amount of fragmentation products is found by excimer laser exposure at 308 nm or 248 nm. The side products mentioned above are fluorescent and their fluorescence band overlaps with the first UV-absorption band of the DNQ. Photolysis of the photosensitizer by this fluorescence may affect the spatial resolution of a photoresist. Numerical simulation of the magnitude of this effect shows that, in practice, the conversion of photosensitizer due to fluorescence is in the order of a few percent at most.

Citation Download Citation

J. J. M. Vleggaar, A. H. Huizer, and Cyril A.G.O. Varma "Effects of fluorescence on the spatial resolution of photoresist materials", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154783

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