Composition of inorganic photoresists and its EBE experiment

Changtai Yu; Hua Yu; Fengzhen Guo; Songzu Xu; Zhougfu Qi; Xiangdong Yu; Yongkuan Liu; Li Peng; Zhongyi Zhang

doi:10.1117/12.154787

15 September 1993 Composition of inorganic photoresists and its EBE experiment

Changtai Yu, Hua Yu, Fengzhen Guo, Songzu Xu, Zhougfu Qi, Xiangdong Yu, Yongkuan Liu, Li Peng, Zhongyi Zhang

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154787
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

We report the composition of inorganic photoresist, film making way and its EBE experiment. With the composed inorganic photoresist, the graph of 0.6 micrometers line width is gained in our experiment.

Citation Download Citation

Changtai Yu, Hua Yu, Fengzhen Guo, Songzu Xu, Zhougfu Qi, Xiangdong Yu, Yongkuan Liu, Li Peng, and Zhongyi Zhang "Composition of inorganic photoresists and its EBE experiment", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154787

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