Understanding CD error sources in optical mask processing

Peter D. Buck

doi:10.1117/12.142151

26 March 1993 Understanding CD error sources in optical mask processing

Peter D. Buck

Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993) https://doi.org/10.1117/12.142151
Event: Photomask Technology, 1992, Sunnyville, CA, United States

Abstract

As mask CD precision and uniformity specifications continue to tighten to 40 nm and below, a better understanding of CD error contributors is required in order to achieve this level of performance. The lithography system, the resist and chrome coatings, development and etching, and metrology all can contribute to the composite CD error. Error sources as small as 10 nm can be significant contributors depending on how the error adds in to the total. In this paper, techniques for isolating and examining these errors are discussed. The CD performance of the CORE-2564 is improved through the systematic optimization of process steps. The implications of `zero-bias' processing are discussed.

Citation Download Citation

Peter D. Buck "Understanding CD error sources in optical mask processing", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142151

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available