Application of laser scatterometry to characterize phase-shifting masks

Susan M. Wilson; Gary A. Peterson Jr.; S. Sohail H. Naqvi; John Robert McNeil

doi:10.1117/12.142147

26 March 1993 Application of laser scatterometry to characterize phase-shifting masks

Susan M. Wilson, Gary A. Peterson Jr., S. Sohail H. Naqvi, John Robert McNeil

Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993) https://doi.org/10.1117/12.142147
Event: Photomask Technology, 1992, Sunnyville, CA, United States

Abstract

Laser scatterometry is a noncontact, rapid method of collecting and analyzing light scattered from a structure. We have applied optical scatter techniques to measure the surface roughness as well as the etch depth of phase shifting masks (PSMs). Experimental results and theoretical modeling are discussed.

Citation Download Citation

Susan M. Wilson, Gary A. Peterson Jr., S. Sohail H. Naqvi, and John Robert McNeil "Application of laser scatterometry to characterize phase-shifting masks", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142147

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